Halbleitertechnologie von A bis Z

Alles über Halbleiter und die Waferfertigung

Ga Gallium
GAC Granular Activated Carbon
GAE Gas-assisted Etch
GASAD Gate And Source And Drain
GC Gas Chromatography
GC Gravimetric Calibrator
GCC Generic Cell Controller
GCD Gas Chromatography Distillation
GCIB Gas Cluster Ion Beam
GCMS Gas Chromatography Mass Spectroscopy
GCR Generalized Cambridge Ring
Gd Gadolinium
GDP Gas Distribution Plate
GDPP Gas Drive Plasma Pinch
GDS Graphical Design System
GDS Graphical Design Software
Ge Germanium
GEM Generic Equipment Model
GEMVS GEM Verification System
GES Generic Equipment Simulator
GFA Gas Fusion Analysis
GFAAS Graphite Furnace Atomic Absorption Spectroscopy
GFAAS Graphite Furnace Atomic Absorption Spectrometry/spectroscopy
GFC Gas Filter Correlation
GFCI Ground Fault Circuit Interrupter
GFIS Gas Field Ion Source
GHG Greenhouse Gas
GI Global Irrigation
GI-XRD Grazing Incidence X-ray Diffraction
GIDL Gate-induced Drain Leakage
GILD Gas Immersion Laser Doping
GISAXS Grazing Incidence Small-angle X-ray Scattering
GJG Global Joint Guidance
GLC Gas Liquid Chromatography
Gm Transconductance
GOF Goodness Of Fitness
GOI Gate Oxide Integrity
GOX Gate Oxide
GPIB General Purpose Interface Bus
GPL Gas Path Length
GPS Global Positioning System
GRC Gas Reactor Column
GRTV Graphite Rapid Thermal Vulcanization
GSCE Gas Source Control Equipment
GSED Gaseous Scattered Electron Detector
GSPID Gain-scheduled Proportional Integro-differential
GTS GEM Test System
GUI Graphical User Interface
GWIM Global Warming Impact Model
GWLE Good Wafer Level Exposure
GWP Global Warming Potential