02 Dry etch processes Ion beam etching Plasma etching Reactive ion etching Etch gases used in dry etching Special Case: Bosch Process (Deep Reactive Ion Etching) Open chapter →
03 Reactor Types General: Structure of a Dry Etch Tool Reactor Types: CCP and ICP in Practice Electron Cyclotron Resonance (ECR) Wafer Chuck: Temperature Control and Electrostatic Clamping Open chapter →
04 Etching of Compound Semiconductors and High-k Materials Why These Materials Are a Special Case III-V Compound Semiconductors (GaAs, InP, GaN) Silicon Carbide (SiC) High-k Dielectrics (HfO₂ and Others) Open chapter →
