01 Film thickness measurement Metrology Interferometry Ellipsometry Evaluation of the Measurement Open chapter →
02 Particle inspection Metrology Laser Scattering Measurement Wafer Map and Classification Review with the Scanning Electron Microscope (SEM) Evaluating the Measurement Open chapter →
03 CD Measurement Metrology CD-SEM – Measurement Principle Calibration and Reference Metrology OCD / Scatterometry as an Alternative CD Uniformity and Process Control Open chapter →
04 Overlay Measurement Registration accuracy between two layers Measurement targets Image-based measurement and DBO Overlay budget and error sources Open chapter →
